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| Keywords: Semiconductors (5884868648).jpg Nanotough Typical low-k film test for material toughness using the new NIST technique The indentation instrument that punches the triangular hole registers the forces involved That plus the length of the resulting cracks determines the toughness of the film which is about 2 4 micrometers thick Color added for clarity Credit NIST Disclaimer Any mention of commercial products within NIST web pages is for information only; it does not imply recommendation or endorsement by NIST Use of NIST Information These World Wide Web pages are provided as a public service by the National Institute of Standards and Technology NIST With the exception of material marked as copyrighted information presented on these pages is considered public information and may be distributed or copied Use of appropriate byline/photo/image credits is requested https //www flickr com/photos/usnistgov/5884868648/ Semiconductors 2008-12-09 14 45 https //www flickr com/people/63059536 N06 National Institute of Standards and Technology PD-USGov National Institute of Standards and Technology https //flickr com/photos/63059536 N06/5884868648 2016-09-07 02 51 02 United States Government Work Uncategorized 2016 December 8 | ||||
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